Three-Dimensional Patterning using Ultraviolet Nanoimprint Lithography

Although an extensive number of publications have been reported on nanoimprint lithography (NIL) techniques, the ability of NIL for three-dimensional (3-D) patterning has not been fully addressed in terms of the mold fabrication and imprint processes. Developing technologies for patterning 3-D and multilevel features are important because they eliminate multiple steps and complex interlevel alignments in the fabrication process of nanoscale devices and structures. The semiconductor industries through the International Technology Roadmap for Semiconductor (ITRS) organization have identified NIL (ITRS 2003; ITRS 2008), especially ultraviolet curable nanoimprint lithography (UV-NIL) as a strong candidate for the next generation lithography (NGL) technology for nodes down to 5 nm. Three dimensional NIL (3D-NIL) will have a variety of practical applications including generating patterns for MEMS and NEMS devices, on-chip optics, antireflection structures and in biochip reactors. This chapter explores the 3-D patterning capability using an UV-NIL technique. The 3-D features and multilevel mold design, fabrication, and imprint processes have been studied and analysed and outcome will be presented and discussed. In the UV-NIL technique, a transparent mold with micro/nanostructure patterns on its surface is allowed to be printed and replicated on UV curable polymer without the need of high applied pressure or temperature. UV-NIL has the potential to fabricate micro/nanostructures with high resolution, high reproducibility, low cost, high throughput and in addition is capable of 3-D patterning. Its resolution is not limited by diffraction as in optical lithography or electron scattering as in electron beam lithography (EBL) and there is no expense that scales with reducing dimensions as in other nanolithography technologies. The UV-NIL technique is especially useful in avoiding processes that require high pressure and high temperature cycles. Mold pattern writing, pattern transfer and imprint are the three major areas that are described here. The master molds or dies are made using a highresolution but low-throughput EBL technique. The pattern transfer process for making the mold is achieved using a reactive ion etching (RIE) technique and subsequent imprint lithography is employed for the replication of the micro/nanostructures onto the daughter molds. Source: Lithography, Book edited by: Michael Wang, ISBN 978-953-307-064-3, pp. 656, February 2010, INTECH, Croatia, downloaded from SCIYO.COM